Detection Range: 400 - 5000ppm (expandable to 40000ppm)
Detection Accuracy: ±(50ppm + 5% of the reading)
Technical Principle: Metal Oxide Semiconductor (MOX)
Detection Objects: CO, NO₂, NH₃ (optional)
Detection Principle: NDIR
Detected Gases: SiF4, CF4, SF6, NF3, CO2
Detection Principle: Ultrasonic measurement principle
Response Time: O₂ concentration: ≤1.5s
Detection Range: PM2.5: 0 - 1000μg/m³
Detection Accuracy: ±15% of the reading or ±15μg/m³ (-20°C - 60°C, calibrated against TSI8530)
Test Gas: Oxygen (O₂)
Detection Principle: Tunable Diode Laser Absorption Spectroscopy (TDLAS)
Detection Principle: Ultrasonic measurement principle
Detection Range: O₂ concentration: 0 - 100%, Flow rate: TBD
Heater Resistance: 3.2Ω ± 0.8Ω
Operating Voltage: 6V - 8V
Heater Resistance: 3.2Ω ± 0.8Ω
System Voltage: 10.8V - 16.5V
Detection Principle: Non - Dispersive Infrared (NDIR) Detection Technology
Tested Gas: Electrolyte Vapor DMC
Detection Principle: Ultrasonic measurement principle
Detection Range: Oxygen concentration: 0 - 100%，Flow rate: 0 - 240L/min
Response Time: Concentration: ≤1.5s; Flow rate: ≤0.3s
Operating Conditions: -5 °C - 50 °C, 0 - 95%RH (non - condensing)
1: 2
Measurement Index: Opacity N: (0 - 99.99)%, Light Absorption Coefficient K: (0 - 16) m⁻¹
Detection Principle: Thermal Conductivity Technology (TC)
Detection Type: H₂
Interface Mode: URAT_TTL
Dimensions (mm): 128.7*42.8*55.2
Measurement Index/Range: Opacity N: (0 - 99.99)%, Light Absorption Coefficient K: (0 - 16) m⁻¹
Resolution: N: 0.1%, K: 0.01 m⁻¹
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